Publikationen
Als eines der weltweit führenden Zentren für Photomasken der jeweils neuesten Generation hat das AMTC seinen Tätigkeitsschwerpunkt im Forschungs- und Entwicklungsbereich der Photomasken- und Halbleiterbranche. Die Ergebnisse der F&E Aktivitäten werden unter anderem auf internationalen Konferenzen vorgestellt.
Nachfolgend sind Publikationen aufgelistet, die AMTC-bezogene Forschungsergebnisse enthalten.
Publikationen
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Spezielle Auszeichnungen
Photomask Technology 2011: 2nd place at best paper award
More than monitoring: advanced lithographic process tuning
Photomask Technology 2018: Best Poster
Multiple exposure on single blank for electron-beam writer characterization
EMLC 2017: Best Paper
Splendidly blended: a machine learning set up for CDU control
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Publikationen - 2023
Proceedings Paper + Presentation | 21 November 2023
Mask error and its contribution to OPC model error for an EUV via layer
Proceedings Paper | 5 October 2023
Divide et impera: a short talk about the importance of feature and model engineering
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Publikationen - 2022
Folgen
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Publikationen - 2021
Proceedings Paper + Presentation | 12 October 2021
3D-MC modelling of particle contamination induced defects in ebeam mask writing
Proceedings Paper | 23 August 2021
Stability of CD off-target: analysis
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Publikationen - 2020
Folgen
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Publikationen - 2019
Proceedings Paper + Presentation | 26 September 2019
Loading effect correction set up by supplementing CD measurement analysis with machine learning
Proceedings Paper | 29 August 2019
Necessity is the mother of invention: support vector machines for CD control
Proceedings Paper | 27 June 2019
Proceedings Paper | 27 June 2019
Deal gently with the bird you are trying to catch: small scale CD control with machine learning
Proceedings Paper | 27 June 2019
Lifetime test on EUV photomask with EBL2
Proceedings Paper + Presentation | 1 May 2019
Experimental Investigation of a high-κ reticle absorber system for EUV lithography
Proceedings Paper + Presentation | 26 March 2019
Towards ultimate image placement accuracy for EUV mask writing with pattern shift process
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Publikationen - 2018
Proceedings Paper + Presentation | 12 November 2018
Mask process correction validation for multi-beam mask lithography
Proceedings Presentation | 12 October 2018
Minimizing tone reversal during 19x nm mask inspection: PMJ18 Best Paper (Conference Presentation)
Proceedings Paper + Presentation | 3 October 2018
Proceedings Paper + Presentation | 3 October 2018
Multiple exposure on single blank for electron-beam writer characterization
Proceedings Paper | 3 October 2018
Applying MPC for EUV mask fabrication
Proceedings Paper | 19 September 2018
Deposition durability of e-beam mask repair
Proceedings Paper | 19 September 2018
Machine learning methods applied to process qualification
Proceedings Paper + Presentation | 2 August 2018
Proceedings Paper | 12 June 2018
Minimizing "Tone Reversal" during 19x nm mask inspection
Proceedings Paper | 12 June 2018
Proceedings Paper | 20 March 2018
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Publikationen - 2017
Proceedings Paper | 28 September 2017
Splendidly blended: a machine learning set up for CDU control
Proceedings Paper | 28 September 2017
Half circle chrome loss by electrochemical effects
Proceedings Paper | 13 July 2017
EUV repair process optimization and integration
Proceedings Paper | 13 July 2017
Effects of hard mask etch on final topography of advanced phase shift masks
Proceedings Paper | 13 July 2017
Etch bias inversion during EUV mask ARC etch