Tekscend Photomask and IMS Nanofabrication Unveil Europe’s First Multibeam Mask Writer at AMTC Dresden
A New Era in European Semiconductor Technology
We are proud to announce the installation of Europe’s first-ever Multibeam Mask Writer, the revolutionary MBMW-100 Flex from IMS Nanofabrication, in close cooperation with Tekscend Photomask (formerly Toppan Photomask). This state-of-the-art tool is designed to meet the demands of advanced semiconductor manufacturing, from advanced optical applications to cutting-edge EUV lithography.
The MBMW-100 Flex, a worldwide first, drastically reduces mask writing time for complex semiconductor designs from multiple days to just 7-12 hours.
The installation of this pioneering technology is also a critical step in Europe’s pursuit of enhanced semiconductor capability. Local high-end photomask production is essential for ensuring a robust and innovative European semiconductor industry. The collaboration between IMS Nanofabrication, Tekscend Photomask and AMTC - all global leaders in their field - exemplifies the critical role that photomask technology plays in the global semiconductor ecosystem.
Read the full press release here:
www.photomask.com